SINGULAR XP

ICP-PECVD Production Platform

Fully automized ICP-PECVD Production Platform

SINGULAR XP ICP-PECVD is a fully automated innovative and modular PECVD coating tool for the mass production of crystalline silicon solar cells. In addition, SINGULAR is increasingly being applied for the development of passivation layers for high-efficiency solar cells following conventional and new cell concepts. Thereby, the coating system meets the demands for both current and future PV cell production.

The SINGULAR system provides an automation module and a coating module. The coating module consists of several customizable vacuum chambers.

The innovative SINGULAR tool is based on static inline production which combines the advantages of inline substrate transport and static processing. It allows the coating of complex layers, such as layer stacks of different materials e. g. AlOx/SiNy. The key feature of the tool is the ICP-PECVD technology.

The inductively coupled plasma (ICP) excitation allows ideal control of film properties for various materials such as SiNx, AlOx, SiOxNy at high deposition rates. The process variability, the small tool footprint in combination with an excellent total ”Cost Of Ownership“ makes SINGULAR ideally suitable for upgrades of existing production lines.

SINGULAR allows developing new manufacturing processes for cell efficiencies above 20 % on proven production platforms.

Therewith, SINGULUS makes a valuable contribution to continuous improvements with respect to efficiency and manufacturing cost of PV modules, being a necessity to reduce the costs and enable the large-scale deployment of PV electricity.
  



SINGULAR – Facts

  • Industrial proven multi-chamber ICP-PECVD coating tool
  • Lowest cost of ownership
  • Modular design for various processes (e. g. SiNx, SiOxNy, AlOx, a-Si ...)
  • Single- and multi-layer capability
  • Double-side coating capability
  • Small footprint
  • Integrated electrical and gas cabinets
  • Efficient use of raw materials like electrical power, process gases ...
  • Low noise level (no grey room necessary)
  • High uptime
  • Easy to operate
  • Easy to maintain
  • Inline cleaning processes available (e. g. for a-Si)
  • Customized tool configuration, e. g. usage of special gases e. g. TMB, phosphine, organic precursors like TMAl
  • Integrated automation solution
  • Inline and cluster operation possible
  • All types of automation cassettes suitable

 

OK

Wir verwenden Cookies, um die Funktionsfähigkeit und Sicherheit dieser Website sicherzustellen. Zudem können Drittanbieter bei Aufruf einzelner Dokumente und Seiten Cookies einrichten. Mit der Nutzung dieser Website erklären Sie sich mit der Verwendung von Cookies einverstanden.

Weitere Informationen zur Änderung dieser Einstellung und zu den verwendeten Cookies finden Sie unter diesem Link.