GERULUS

Main Components

1 Transport cart (for in- and output)
  • For up to two carriers
  • For wet transport from/ to STANGL Pre-cleaner
  • Discharge and filling at semi-automatic filling station at wet bench, minimized dripping due to optimized coupling devices
  • Guide rolls matching to guidance system at STANGL Pre-cleaner
2 Input buffer
  • Static bath for wet buffering of carriers
  • Capacity: 4 carriers
  • Media: DI water, recycling water, or glycol
3 Pre-clean bath
The wafer blocks are pre-cleaned in a patented
pre-clean bath. This comprises:
  • Moving spray bars aside the wafer block (spray image
    optimized for cleaning narrow gaps)
  • Quick dump of bath in 1 second or less
  • Optionally: motoric tilting of carrier
  • Optionally: ultrasonic treatment with dual frequency
  • Overflow bath
  • Media: DI water or recycling water + surfactant
  • Fresh water consumption optimized by use of centrifuge recycling water
  • Automatic cover
  • All of the special elements of the Pre-clean bath can be individually programmed to fit your individual cleaning needs
4 Deglue chamber
Any exposure to hazardous chemicals is minimized because in regular operation the process chamber is only loaded and unloaded when no acid is present.
  • Recirculated overflow bath
  • Capacity: 1 carrier
  • Media: hot DI water or acid (e.g. acidic acid)
  • Automatic cover with water sealing
  • Acid is put in buffer tank during rinsing action 
  • Acid can be re-used several times
  • All of the special elements of the Deglue chamber can be individually programmed to fit your individual deglueing needs for your glue.
5 Output buffer
  • Overflow cascade for wet buffering and final rinsing of carriers
  • Capacity: 4 carriers
  • Media: DI water
  • Carriers are final-rinsed by passing through this
    4-step DI cascade
6 Installation area
  • Fully PP covered installation area
  • For electrics (fully encapsulated versus fluids)
  • For process technology elements (pumps, dosage units, pneumatics, …)
  • Media connection points
  • For supply tanks
7 Waste water pump stations (optional)
  • If waste water cannot be disposed by gravity
  • Flat reservoir tanks behind main machine
  • Equipped with centrifugal pumps to provide necessary
    pressure to lift waste water to desired disposal level
  • Full automatic control (no user interference necessary)
  • Number of tanks depends on number of different waste water types
8 Hot DI water station (optional)
  • To provide main machine with hot DI water
  • Used if fab does not have sufficient hot DI supply
  • Equipped with high performance DI inline heater
  • Equipped with hot DI water storage tank
    (optionally equipped with an additional heating system)
  • Autonomous operation with own PLC station
  • Communication to main automat via Profibus coupling
  • Can be coupled to several pre-cleaners
9 Surfactant dosage station
  • To provide system with surfactant in pre-cleaning step
  • High-precision dosage pump
  • Equipped with 30 -60 liter buffer tank
  • Can be connected to central supply line or to local surfactant drum (connection gear and suction pump included)
10, 11 Water recycling station
10 Dirt and pure water tanks
11 Centrifuge

  • All discharge water from the first half of the STANGL Pre-Cleaner can be given to this recycling system.
  • The system consists of
    • A professional centrifuge for separation of solid material from liquid
    • Sludge cake cart for disposal of solid material
    • Dirt water tank
    • Pure water tank with heating system
  • The system can process up to 200 l /min of dirt water
  • By the use of this system total fresh DI consumption per wafer block is approx. 200 liters (depending on cleaning cycle)
  • Autonomous operation with own PLC station
  • Communication to main automat via Profibus coupling
  • Optional support for recycling of the SiC/Si sludge