SILEX
Technical Features
| Main Features | WB-PSG1500 RL/LR | WB-PSG3000 RL/LR |
| Dimension L/W/H mm: Wet bench Option sump pump tank | 6700/2300/3060 | 8500/2300/3060 |
| Capacity max.: | 1500 wph | 3000 wph |
| Batch Size: | 100 wafer | 200 wafer |
| Wafer Material: | Si, mono, multi, 156 x 156 mm, > 150 μm | |
| Utilities: | N2, CDA, DI-water HF waste drains electrical power 400 VAC 3/PE | |
| Exhaust: | 2700 m3/h | 3600 m3/h |
| Typical Cycle Time: | 270 s | 270 s |
| Main Features | WB-ALTEX1500 RL/LR | WB-ALTEX3000 RL/LR |
Dimension L/W/H mm: | 13000/2300/3060 | 17000/2300/3060 |
| Capacity max.: | 1500 wph | 3000 wph |
| Wafer Material: | Si, mono, multi, 156 x 156 mm, > 150 μm | |
| Batch Size: | 200 wafer | 200 wafer |
| Utilities: | N2, CDA, DI-water, PCW, tap water | |
| Exhaust: | 8000 m3/h | 9500 m3/h |
| Typical Cycle Time: | 270 s | 270 s |
| Main Features | WB-ISOTEX1500 RL/LR | WB-ISOTEX3000 RL/LR |
| Dimension L/W/H mm: Wet bench Chiller station Day tank Option sump pump tank | 15000/2300/3060 | 17000/2300/3060 |
| Capacity: | 1500 wph | 3000 wph |
| Wafer Material: | Si, multi, 156 x 156 mm, > 150 μm | |
| Batch Size: | 200 wafer | 200 wafer |
| Utilities: | N2, CDA, DI-water, PCW, tap water HF, KOH, HCl, HF, HNO3, (HAc) waste drains electrical power 400 VAC 3/PE | |
| Exhaust: | 6500 m3/h | 8500 m3/h |
| Typical Cycle Time: | 120-270 s | 120-270 s |